Table 3

Parameters of stages of the technological process of deposition of coatings.

Process PN (Pa) U (V) ICr (A) IAl (A) ITi (A) IZr–Nb, (A)
The preparatory stage (pumping out, heating) 0.06 +20 80 120 65 75
Heating and cleaning using gas plasma. 2.0 100 DC/900 AC f = 10 kHz, 2:1 80
Deposition of coating 0.36 −800 DC 70 160 55 70
Cooling of products 0.06

Note:ICr = current of chromium cathode, ITi = current of titanium cathode, IAl = current of aluminum cathode, IZr-Nb = current of Zr-Nb cathode, PN = gas pressure in chamber, U = voltage on substrate.

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